Pulsed Laser Deposition (PLD) 5-axes Substrate Holder
Substrate dimension is customized. SiC is used as heater for Oxygen condition. Substrate can be heated to over 1000 ¡æ with lower than 3% difference. 5-axes manipulator. XY=¡À10mm, Z=150mm, motor controlled azimuthal continuous rotation, polar rotation. One shutter before substrate. Thermal couple is set between heater and substrate. Substrate change can be done in vacuum.
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